December 9, 2020 – PostProcess has announced the granting of another patent in the United States. U.S. Patent No. 10,850,449 “Method and Apparatus for Support Removal Using Directed Atomized and Semi-Atomized Fluid,” issued December 1, 2020, covers PostProcess’ Volumetric Velocity Dispersion (VVD) technology.
The transformative VVD technology works in tandem with patent-pending detergents and proprietary software to effectively remove support materials from 3D printed polymer parts. Implementing a high-volume, low-pressure spray method, this technology was developed to keep part geometries intact while improving post-printing efficiencies.
This patent is one of more than 50 that PostProcess has filed worldwide, encompassing its integrated full-stack solutions of software, hardware, and chemistry across several technology families. Counterpart patent applications for the VVD technology are currently pending in several other countries. Receiving this distinction for VVD further confirms the revolutionary innovation that is behind every PostProcess solution.
Regarding the patent issuance, Daniel Hutchinson, Founder/CTO at PostProcess, said, “This recognition comes not long after the patenting of our SVC technology, so we are delighted to add yet another PostProcess innovation to our repertoire of pioneering technologies. It’s clear to see that our commitment to trailblazing the automated post-printing industry is making a significant impact on helping users reach production scale as we strive to close the digital loop and further digitalize the additive landscape.”
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